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US 6,819,053 B2Granted
Hall effect ion source at high current density
AssigneeTokyo Electron Limited
InventorWayne L. Johnson
Life of this patent
Estimating the term…
Abstract
A high current density, low voltage ion source includes a vacuum chamber. A plasma source induces generation of a plasma within the chamber, or injects a plasma directly into the chamber. A magnetic and electric field cooperate to guide the ions from the plasma region in a beam towards a substrate to be processed by the ions. A method of use of the ion source includes production of an ion beam for processing of a substrate.
Claims20
A high current density ion source, comprising:
- an end-Hall effect ion source including a vacuum chamber, for producing an ion beam;
- a plasma generator, arranged to produce a plasma located in the vacuum chamber to supply ions to the ion source;
- and
- a cathode, disposed within the vacuum chamber, between the plasma generator and a target, for accelerating ions from the plasma generator toward the target.
1 more element
A high current density ion source, comprising:
- a vacuum chamber having an end defining a target region;
- a gas injector, constructed and arranged to inject a gas which is ionizable to produce a plasma in the vacuum chamber;
- a radio frequency electromagnetic field source, constructed and arranged to provide a radio frequency electromagnetic field in a plasma generating region within the vacuum chamber, the electromagnetic field ionizing the gas to produce a plasma;
- a magnetic field source, constructed and arranged to produce a magnetic field for guiding the plasma;
- and
- a cathode, disposed within the vacuum chamber, between the plasma generating region and the target region for accelerating ions from the plasma generating region toward the target region.
3 more elements
A method of processing a substrate with ions, comprising:
- providing a vacuum chamber;
- providing a substrate located at an end of the vacuum chamber in a target area;
- providing a gas in the vacuum chamber which is ionizable to form a plasma;
- providing an electromagnetic field in a plasma generating region within the vacuum chamber, thereby ionizing the gas to produce a plasma;
- providing a magnetic field for guiding the plasma;
- providing a cathode within the vacuum chamber, the cathode having an opening therethrough, such that ions traveling from the plasma generating region to the target area pass through the opening in the cathode;
- and
- controlling an electric field produced by the cathode and the magnetic field to extract ions from the plasma and direct them to the target area such that they impinge on the substrate.
5 more elements
Dependencies are inferred from the claim text.