Method for forming a micro-pattern on a substrate

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a mold having a predetermined share into the polymer film on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein before said step (b), the polymer film has been prepared as a film having a porous structure.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a mold having a predetermined shape into the polymer film on the substrate by employing a predetermined compression technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein the method before said step (b), further comprises:
• (b11) mounting the substrate having the polymer film in a reactor provided with a vessel having a solvent therein;
• and
• (b12) heating the vessel at a predetermined temperature range to render the solvent in the vessel to evaporate, thereby making an evaporated solvent penetrate into the polymer film and accordingly leaving the penetrated solvent in the polymer film.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a first mold having a first predetermined shape into the polymer film on the substrate to form a first patterned polymer film and then pressing a second mold having a second predetermined shape into the first patterned polymer film by employing a predetermined compression technique, thereby providing a patterned polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein the method further comprises the step of:
• (b1) before said step (b), increasing a free volume in the polymer film so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a first mold having a first predetermined shape into the polymer film on the substrate to form a first patterned polymer film and then pressing a second mold having a second predetermined shape into the first patterned polymer film by employing a predetermined compression technique, thereby providing a patterned polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein the method before said step (b), further comprises the steps of:
• (b11) mounting the substrate having the polymer film in a reactor provided with a vessel having a solvent therein;
• and
• (b12) heating the vessel at a predetermined temperature range to render the solvent in the vessel to evaporate, thereby making an evaporated solvent penetrate into the polymer film and accordingly leaving the penetrated solvent in the polymer film.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a first mold having a first predetermined shape into the polymer film on the substrate to form a first patterned polymer film and then pressing a second mold having a second predetermined shape into the first patterned polymer film by employing a predetermined compression technique, thereby providing a patterned polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein before said step (b), the polymer film has been prepared as a film having a porous structure.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) pressing a first mold having a first predetermined shape into the polymer film on the substrate to form a first patterned polymer film and then pressing a second mold having a second predetermined shape into the first patterned polymer film by employing a predetermined compression technique, thereby providing a patterned polymer film;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein said step (b) is performed at a temperature below the glass transition temperature of the polymer material,
• wherein the first mold has a higher aspect ratio than the second mold.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) repeatedly pressing a mold having a predetermined shape into the polymer film on the substrate by employing a step-and-repeat technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film, wherein the length of the substrate is greater than that of the mold;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein the method further comprises the step of:
• (b1) before said step (b), increasing a free volume in the polymer film so that a pressure applied on the polymer material needed to plastically deform the polymer film is reduced.

A method for forming a micro-pattern on a substrate, the method comprising the steps of:

• (a) coating polymer material having a solvent on the substrate, thereby forming a polymer film on the substrate;
• (b) repeatedly pressing a mold having a predetermined shape into the polymer film on the substrate by employing a step-and-repeat technique to entail a plastic deformation of the polymer film, thereby patterning the polymer film, wherein the length of the substrate is greater than that of the mold;
• and
• (c) performing etching on the substrate through the use of the patterned polymer film as an etching mask, thereby forming a micro-pattern on the substrate,
• wherein the method before said step (b), further comprises the steps of:
• (b11) mounting the substrate having the polymer film in a reactor provided with a vessel having a solvent therein;
• and
• (b12) heating the vessel at a predetermined temperature range to render the solvent in the vessel to evaporate, thereby making an evaporated solvent penetrate into the polymer film and accordingly leaving the penetrated solvent in the polymer film.