A method for producing an integrated circuit, comprising:
- forming a peeling layer in which the bonding force weakens under certain conditions on a forming substrate;
- forming an integrated circuit layer including an integrated circuit on the peeling layer;
- joining the integrated circuit layer with a dissolvable bonding layer to a temporary transfer substrate;
- weakening the bonding force of the peeling layer to peel the integrated circuit layer from the forming substrate, and moving the integrated circuit layer to the temporary transfer substrate;
- applying resin directly onto a bottom side of the integrated circuit layer which has been moved to the temporary transfer substrate, and curing the resin to form a sole resin substrate;
- and
- dissolving the bonding layer to peel the temporary transfer substrate from the resin substrate to produce the integrated circuit.