System for and method of processing substrate

A method of processing substrates placed respectively in a plurality of processing units in parallel, said plurality of processing units each executing substantially the same substrate processing, said method comprising the steps of:

• a) transmitting a reference command value to said plurality of processing units to perform substrate processing;
• b) obtaining a plurality of measured values indicating respective processing states in said plurality of processing units detected in said step a);
• and
• c) computing a plurality of correction amounts from said reference command value and said measured values, said plurality of correction amounts making the processing states in said plurality of processing units substantially the same.

A substrate processing system comprising:

• a) a first substrate processing apparatus;
• b) a second substrate processing apparatus connected through a network to said first substrate processing apparatus;
• and
• c) an information processor connected through said network to said first and second substrate processing apparatuses;
• said information processor including:
• c-1) a first database for storing a reference value as a control command value for controlling a substrate processing environment of said first processing apparatus;
• c-2) a first sending part for transmitting said reference value stored in said first database as said control command value for controlling a substrate processing environment of said second substrate processing apparatus;
• c-3) a receiving part for receiving a measured value from said second substrate processing apparatus, said measured value indicating the substrate processing environment of said second substrate processing apparatus detected when said second substrate processing apparatus is controlled in accordance with said reference value transmitted from said first sending part;
• c-4) a computing part for computing a correction amount from said reference value transmitted from said first sending part and said measured value, said correction amount making the substrate processing environments of said first and second processing apparatuses substantially the same;
• c-5) a second database for storing said correction amount in association with said reference value transmitted from said first sending part, and
• c-6) an extraction part for extracting a corresponding correction amount from said second database, said corresponding correction amount being said correction amount corresponding to a select reference value selected as said reference value from said first database,
• said second substrate processing apparatus including:
• b-1) a control part for controlling an element in said second substrate processing apparatus, based on said control command value transmitted from said information processor;
• b-2) a measuring part for obtaining said measured value;
• and
• b-3) a second sending part for transmitting said measured value to said information processor, wherein
• said first sending part transmits said select reference value corrected using said corresponding correction amount as said control command value to said second substrate processing apparatus.

A method of processing a substrate, comprising the steps of:

• a) transmitting a reference value transmitted as a control command value to both, a first substrate processing apparatus having a first environment controller for controlling a substrate processing environment and also to a second substrate processing apparatus having a second environmental controller capable of executing substantially the same processing as said first environmental controller, to set a substrate processing environment of said second substrate processing apparatus;
• b) acquiring a measured value indicating the substrate processing environment of said second substrate processing apparatus detected when said second substrate processing apparatus is controlled using said reference value;
• and
• c) computing a correction amount for said reference value from said reference value and said measured value, said correction amount making the substrate processing environments of said first and second substrate processing apparatuses substantially the same.

A substrate processing system comprising:

• a) a substrate processing apparatus having a plurality of processing units capable of processing substrates in parallel, said plurality of processing units each executing substantially the same substrate processing;
• and
• b) an information processor connected through a network to said substrate processing apparatus,
• said information processor including:
• b-1) a first sending part for transmitting a first reference value as a control command value for a substrate processing function to said plurality of processing units;
• b-2) a receiving part for receiving a plurality of measured values from said substrate processing apparatus, said plurality of measured values indicating respective substrate processing states in said plurality of processing units detected when said plurality of processing units are controlled in accordance with said first reference value transmitted as said control command value;
• b-3) a computing part for computing a plurality of correction amounts from said first reference value and said plurality of measured values, said plurality of correction amounts making the substrate processing states in said plurality of processing units substantially the same;
• and
• b-4) a first database for storing said plurality of correction amounts in association with said first reference value,
• said substrate processing apparatus including:
• a-1) a control part for controlling substrate processing in said plurality of processing units, based on said control command value transmitted from said information processor;
• a-2) a measuring part for obtaining said plurality of measured values;
• and
• a-3) a second sending part for transmitting said plurality of measured values to said information processor.

A substrate processing system comprising:

• a) a substrate processing apparatus having a plurality of processing units capable of processing substrates in parallel, said plurality of processing units each executing substantially the same substrate processing;
• and
• b) an information processor connected through a network to said substrate processing apparatus,
• said information processor including:
• b-1) a first sending part for transmitting a first reference value as a control command value for a substrate processing function to said plurality of processing units;
• b-2) a receiving part for receiving a plurality of measured values from said substrate processing apparatus, said plurality of measured values indicating respective substrate processing states in said plurality of processing units detected when said plurality of processing units are controlled in accordance with said first reference value transmitted as said control command value;
• b-3) a computing part for computing a plurality of correction amounts from a specific measured value indicating a processing state in one of said plurality of processing units and the remainder of said measured values other than said specific measured value, said plurality of correction amounts making the substrate processing state in other than said one processing unit substantially the same as that in said one processing unit;
• and
• b-4) a first database for storing said plurality of correction amounts in association with said first reference value,
• said substrate processing apparatus including:
• a-1) a control part for controlling substrate processing in said plurality of processing units, based on said control command value transmitted from said information processor;
• a-2) a measuring part for obtaining said plurality of measured values;
• and
• a-3) a second sending part for transmitting said plurality of measured values to said information processor.

A substrate processing system comprising:

• a) a first substrate processing apparatus having a first environment controller for controlling a substrate processing environment;
• b) a second substrate processing apparatus connected through a network to said first substrate processing apparatus, said second substrate processing apparatus having a second environment controller capable of executing substantially the same processing as said first environment controller;
• and
• c) an information processor connected through said network to said first and second substrate processing apparatuses,
• said information processor including:
• c-1) a first database for storing a reference value as a control command value for controlling a substrate processing environment of said first substrate processing apparatus;
• c-2) a first sending part for transmitting said reference value stored in said first database as said control command value for controlling a substrate processing environment of said second substrate processing apparatus;
• c-3) a receiving part for receiving a measured value from said second substrate processing apparatus, said measured value indicating the substrate processing environment of said second substrate processing apparatus detected when said second substrate processing apparatus is controlled in accordance with said reference value transmitted from said first sending part;
• c-4) a computing part for computing a correction amount from said reference value transmitted from said first sending part and said measured value, said correction amount making the substrate processing environments of said first and second processing apparatuses substantially the same;
• and
• c-5) a second database for storing said correction amount in association with said reference value transmitted from said first sending part,
• said second substrate processing apparatus including:
• b-1) a control part for controlling an element in said second substrate processing apparatus, based on said control command value transmitted from said information processor;
• b-2) a measuring part for obtaining said measured value;
• and
• b-3) a second sending part for transmitting said measured value to said information processor.