X-ray diffraction apparatus
AssigneeRigaku Corporation
InventorsHitoshi Okanda, Go Fujinawa
Life of this patent
Estimating the term…
Loading patent…
AssigneeRigaku Corporation
InventorsHitoshi Okanda, Go Fujinawa
Estimating the term…
In the measurement with the focusing method, an X-ray beam from an X-ray source passes through an opening of a path-selection slit device and is narrowed by a divergence slit with a predetermined divergence angle and is thereafter incident upon a sample. The changing operation from the focusing method into the parallel beam method is carried out by turning, by 180 degrees, the path-selection slit device around its axis of rotation and by moving the divergence slit in a direction perpendicular to an X-ray traveling direction. Then, the X-ray beam from the X-ray source is reflected by a multilayer mirror to become a parallel beam and passes through the opening of the path-selection slit device and is thereafter incident upon the sample. Thus, the turning of the path-selection slit device enables the change between the focusing method and the parallel beam method, requiring no re-setting operation for the optical system.
X-ray diffraction apparatus in which an X-ray source emits an X-ray beam which is incident upon a sample, diffracted by said sample and detected by an X-ray detector, comprises:
X-ray diffraction method in which an X-ray source emits an X-ray beam which is incident upon a sample, diffracted by said sample and detected by an X-ray detector, comprising the steps of:
Dependencies are inferred from the claim text.