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US 6,806,653 B2Granted
Method and structure to segment RF coupling to silicon electrode
AssigneeTokyo Electron Limited
InventorsEric J. Strang, Andrej S. Mitrovic
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Abstract
An electrode assembly for use in a plasma processing system including a base electrode adapted to be coupled to a source of RF energy, a removable electrode removably coupled to the base electrode, and a material interposed between a surface of the base electrode and a surface of the removable electrode.
Claims24
A plasma processing system comprising:
- a vacuum chamber;
- a RF power supply;
- and
- an electrode assembly disposed within said vacuum chamber, said electrode assembly comprising:
- a base electrode adapted to be coupled to a source of RF energy;
- a removable electrode removably coupled to said base electrode;
- and
- a material interposed between a surface of said base electrode and a surface of said removable electrode.
5 more elements
An electrode assembly comprising:
- a base electrode adapted to be coupled to a source of RF energy;
- a removable electrode removably coupled to said base electrode;
- and
- material interposed between a surface of said base electrode and a surface of said removable electrode,
- wherein said material is spatially configured to affect the coupling of said RF energy between said base electrode and said removable electrode.
2 more elements
Dependencies are inferred from the claim text.