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US 6,806,652 B1Granted
High-density plasma source using excited atoms
AssigneeZond, Inc.
InventorRoman Chistyakov
Life of this patent
Estimating the term…
Abstract
The plasma source includes a cathode assembly. An anode is positioned adjacent to the cathode assembly. An excited atom source generates an initial plasma and excited atoms from a volume of feed gas. The initial plasma and excited atoms are located proximate to the cathode assembly. A power supply generates an electric field between the cathode assembly and the anode. The electric field super-ionizes the initial plasma so as to generate a high-density plasma.
Claims35
A high-density plasma source comprising:
- a) a cathode assembly;
- b) an anode that is positioned adjacent to the cathode assembly;
- c) an excited atom source that generates an initial plasma and excited atoms from a volume of feed gas, the initial plasma and excited atoms being proximate to the cathode assembly;
- and
- d) a power supply that generates an electric field between the cathode assembly and the anode, the electric field super-ionizing the initial plasma so as to generate a high-density plasma.
2 more elements
A method of generating a high-density plasma, the method comprising:
- a) generating an initial plasma and excited atoms from a volume of feed gas;
- b) transporting the initial plasma and excited atoms proximate to a cathode assembly;
- and
- c) super-ionizing the initial plasma proximate to the cathode assembly, thereby generating a high-density plasma.
1 more element
A high-density plasma source comprising:
- a) means for generating an initial plasma and excited atoms from a volume of feed gas;
- b) means for transporting the initial plasma and excited atoms proximate to a cathode assembly;
- and
- c) means for super-ionizing the initial plasma proximate to the cathode assembly, thereby generating a high-density plasma.
1 more element
Dependencies are inferred from the claim text.