High-density plasma source
AssigneeZond, Inc.
InventorRoman Chistyakov
Life of this patent
Estimating the term…
Abstract
The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.
Claims46
A plasma source comprising:
- a cathode assembly comprising an inner cathode section and an outer cathode section;
- an anode that is positioned adjacent to the outer cathode section and forming a gap there between;
- a first power supply that generates a first electric field across the gap, the first electric field ionizing a volume of feed gas that is located in the gap, thereby generating an initial plasma;
- and
- a second power supply that generates a second electric field proximate to the inner cathode section, the second electric field super-ionizing the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.
A method of generating a high-density plasma, the method comprising:
- generating a first electric field across a gap between an anode and an outer cathode section, the first electric field ionizing a volume of feed gas that is located in the gap, thereby generating an initial plasma in the gap;
- exchanging the initial plasma with a second volume of feed gas while applying the first electric field across the gap, thereby generating an additional plasma in the gap;
- and
- generating a second electric field proximate to the inner cathode section, the second electric field super-ionizing the initial plasma, thereby generating a plasma comprising a higher density of ions than the initial plasma.
A segmented cathode assembly for generating a high-density plasma, the segmented cathode assembly comprising:
- an inner cathode section;
- an outer cathode section that surrounds the inner cathode section;
- and
- a first anode that is positioned adjacent to the outer cathode section and forming a gap there between.
A method of generating a high-density plasma, the method comprising:
- ionizing a volume of feed gas that is located in a gap between an anode and an outer cathode section to generate an initial plasma;
- transporting the initial plasma proximate to an inner cathode section;
- and
- super-ionizing the initial plasma that is located proximate to the inner cathode section, thereby generating a plasma comprising a higher density of ions than the initial plasma.
A plasma source comprising:
- means for generating a first electric field across a gap between an anode and an outer cathode section, the first electric field ionizing a volume of feed gas that is located in the gap, thereby generating an initial plasma in the gap;
- means for exchanging the initial plasma with a second volume of feed gas while applying the first electric field across the gap, thereby generating an additional plasma in the gap;
- and
- means for generating a second electric field proximate to an inner cathode section, the second electric field super-ionizing the initial plasma, thereby generating a plasma comprising a higher density of ions than the initial plasma.
A plasma source comprising:
- means for ionizing a volume of feed gas that is located in a gap between an anode and an outer cathode section to generate an initial plasma;
- means for transporting the initial plasma proximate to an inner cathode section;
- and
- means for super-ionizing the initial plasma that is located proximate to the inner cathode section, thereby generating a plasma comprising a higher density of ions than the initial plasma.
Dependencies are inferred from the claim text.