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US 6,806,416 B1Granted
Maintenance of fluidic dielectrics in RF devices
AssigneeHarris Corporation
InventorRandy T. Pike
Life of this patent
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Abstract
Method for preventing degradation of a fluid dielectric (106) in an RF device (100). The method can include the steps forming a substrate (102) of the RF device (100) from a low temperature co-fired ceramic (LTCC), positioning within a cavity structure (104) of the substrate (102) at least one fluid dielectric (106), and agitating the fluid dielectric (106) with a piezoelectric device (112). According to one aspect of the invention, the piezoelectric device (112) can be formed from lead zirconate titanate.
Claims22
A method for preventing degradation of a fluid dielectric in an RF device, comprising the steps of:
- forming a substrate of said RF device from a low temperature co-fired ceramic (LTCC);
- positioning within a cavity structure of said substrate at least one fluid dielectric;
- and
- agitating said fluid dielectric with a piezoelectric device.
1 more element
An RF device comprising:
- a substrate formed of a low temperature co-fired ceramic (LTCC);
- a cavity structure formed within said substrate;
- at least one fluid dielectric contained within said cavity structure;
- and
- a piezoelectric device for agitating said fluid dielectric.
2 more elements
Dependencies are inferred from the claim text.