Etching method and etching liquid
AssigneesSony Corporation, St Liquid Crystal Display Corporation, Mitsubishi Chemical Corporation
InventorsMasaki Munakata, Hirohito Komatsu, Satoshi Kumon, Kazuma Teramoto, Nobuhiro Goda, Masakazu Motoi, Noriyuki Saitou, Toshiaki Sakakihara, Makoto Ishikawa
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Abstract
A silver or silver alloy thin layer on a substrate is etched by an etching liquid uniformly without producing an etching residue while avoiding side etching due to over etching. The etching liquid contains silver ions in a range from 0.005 to 1 weight %. The etching liquid is fed to a tank or an etching liquid feeding apparatus, and then brought into contact with the silver or silver alloy thin layer on the substrate.
Claims12
An etching method for etching a silver or silver alloy thin layer on a substrate, comprising the steps of:
- preparing initially an etching liquid containing silver ions in a range from 0.005 to 1 weight %,
- supplying the etching liquid into an etching tank or an etching liquid feeding apparatus, and
- contacting said thin layer with the etching liquid for etching.
An etching liquid for etching silver or its alloy, containing silver ions in a range from 0.005 to 1 weight % before etching the silver or its alloy.
Dependencies are inferred from the claim text.