Plasma processing apparatus and method using active matching
AssigneeHitachi, Ltd.
InventorsMasahiro Sumiya, Naoki Yasui, Seiichi Watanabe, Hitoshi Tamura
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Abstract
A plasma processing method and apparatus are proposed that are suited to process the surface of a sample such as a semiconductor device using plasma. The bias voltages to the plasma generation and sample are respectively independently controlled, the RF voltage waveform as the bias voltage to a substrate electrode on which the sample is placed is flattened at an arbitrary voltage level, thereby controlling the energy distribution of ions incident to the sample to be a desired distribution. Therefore, plasma processing can be carried out with high precision.
Claims10
A plasma processing method for processing a sample using a plasma, comprising the steps of:
- applying RF power for generating said plasma in a processing chamber;
- applying RF bias voltage to a substrate electrode on which said sample is placed by another RF power which is independently controlled with respect to said RF power applied for the plasma generation and which has a waveform of a predetermined frequency;
- and
- flattening the voltage waveform of said RF bias voltage applied to said substrate electrode by cutting off the bias voltage waveform at a voltage level for controlling an energy distribution of ions incident to said sample.
A plasma processing method for processing a sample using plasma, comprising the steps of:
- applying RF power for generating said plasma in a processing chamber;
- applying RF bias voltage to a substrate electrode on which said sample is placed by another RF power which is independently controlled with respect to said RF power applied for the plasma generation and which has a waveform of a predetermined frequency;
- and
- flattening the voltage waveform of said RF bias voltage applied to said substrate electrode by cutting off positive and negative voltage sides of the bias voltage waveform at voltage levels for controlling an energy distribution of ions incident to said sample.
A plasma processing method for processing a sample in a processing chamber in which said plasma is produced, said method comprising the steps of:
- generating a plasma in said processing chamber by using an RF power source;
- applying an RF bias voltage to a substrate electrode on which said sample is placed in said processing chamber, said RF bias voltage being supplied from another RF power source and having a waveform of a predetermined frequency;
- and
- flattening the voltage waveform of said RF bias voltage applied to said substrate electrode by cutting off the bias voltage waveform at a voltage level for controlling an energy distribution of ions incident to said sample.
Dependencies are inferred from the claim text.