Healing of micro-cracks in an on-chip dielectric
AssigneeIntel Corporation
InventorsSteven N. Towle, Anna M. George
Life of this patent
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AssigneeIntel Corporation
InventorsSteven N. Towle, Anna M. George
Estimating the term…
In one embodiment there is provided a method comprising performing a singulation operation on a wafer; and treating the wafer to at least reduce a propagation of micro-cracks formed in the wafer during the singulation. In another embodiment there is provided a semi-conductor die comprising a substrate having a central first portion, and a peripheral second portion around the central first portion; an integrated circuit formed on the central first portion; and a guard ring disposed between the first and second portions of the substrate to prevent a propagation of micro-cracks formed in the second portion into the first portion, the micro-cracks having been formed during a singulation operation to separate the semiconductor die from a wafer, wherein the second portion includes micro-cracks filled with a crack-healing material to arrest propagation of the micro-cracks beyond the ring and into the central first portion.
A method, comprising:
Dependencies are inferred from the claim text.