Optical waveguide device and method for forming optical waveguide device
AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsYasuyuki Miyama, Hirotoshi Nagata, Toshihiro Sakamoto, Tetsuya Fujino
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AssigneeSumitomo Osaka Cement Co., Ltd.
InventorsYasuyuki Miyama, Hirotoshi Nagata, Toshihiro Sakamoto, Tetsuya Fujino
Estimating the term…
An optical waveguide is formed on a substrate made of a material with an electro-optic effect. Then, an intermediate layer is fabricated, on the main surface of the substrate, by a dielectric material selected from the group consisting of AOx, B2Oy, COz (A: divalent element, B: trivalent element, C: quadrivalent element, 0<x<1, 0<y<3, 0<z<2, O: oxygen). Then, a metal-cladding type optical polarizer is fabricated on the intermediate layer and the optical waveguide. A buffer layer is formed and partially removed by non-reactive dry-etching to form a first opening. Subsequently, a metal-cladding type optical polarizer is fabricated inside the first opening, and a signal electrode and a ground electrode, constituting a modulation electrode, are fabricated on the buffer layer.
A method for fabricating an optical waveguide device including an optical waveguide, a buffer layer, a metal-cladding type optical polarizer and a modulation electrode on a substrate with an electro-optic effect, comprising:
A fabrication method as defined in claim 4, wherein the third step includes a fifth step of partial removal of the buffer layer in its thickness direction employing reactive dry-etching.
Dependencies are inferred from the claim text.