Method of manufacturing monolithic ink-jet printhead
AssigneeSamsung Electronics Co., Ltd.
InventorsYong-shik Park, Sang-wook Lee, Jae-sik Min, Seo-hyun Cho, Keon Kuk
Life of this patent
Estimating the term…
Loading patent…
AssigneeSamsung Electronics Co., Ltd.
InventorsYong-shik Park, Sang-wook Lee, Jae-sik Min, Seo-hyun Cho, Keon Kuk
Estimating the term…
A method of manufacturing a monolithic ink-jet printhead includes preparing a silicon substrate, forming an ink passage comprising a manifold supplying ink, an ink chamber filled with ink supplied from the manifold, an ink channel connecting the ink chamber to the manifold, and a nozzle through which the ink is ejected from the ink chamber, on the silicon substrate, and reprocessing a wall of the ink passage by passing XeF2 gas through the ink passage and dry etching the wall of the ink passage. In the reprocessing of the wall of the ink passage using XeF2 gas, the wall of the ink passage is smoothed, and a size of the ink passage can be more precisely adjusted to a design dimension, thereby improving a printing performance of the ink-jet printhead.
A method of manufacturing a monolithic ink-jet printhead, the method comprising:
A method of manufacturing a monolithic ink-jet printhead, the method comprising:
The method of clam 26, wherein the first depth is greater than the second depth.
Dependencies are inferred from the claim text.