Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same

A method of forming a polymer optical waveguide pattern, comprising the steps of:

• applying and drying a photosensitive composition for optical waveguides;
• irradiating said resultant photosensitive composition thin film for optical waveguides with light through a mask;
• and
• directly forming a core-ridge pattern by wet etching said photosensitive composition thin film;
• wherein the photosensitive composition comprises
• an organic oligomer, said organic oligomer being a silicone oligomer represented by the following formula (3):
• wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group;
• m is an integer from 1 to 5;
• x and y designate the proportion of respective units, and neither x nor y is 0;
• and R1 and R2 may be the same as or different from each other, and denote a methyl, ethyl, or isopropyl group;
• a polymerization initiator which is an acid generator;
• and a crosslinking agent which is a separate, independent compound from said silicone oligomer.