Back to results
US 6,806,023 B2Granted
Positive radiation-sensitive composition
AssigneeFuji Photo Film Co., Ltd.
InventorsShinichi Kanna, Kunihiko Kodama
Life of this patent
Estimating the term…
Abstract
A positive radiation-sensitive composition comprising: (a) a resin whose solubility in an alkali developer increases by the action of an acid; (b) a compound which generates a carboxylic acid having a molecular weight of 100 or less upon irradiation with an actinic ray or a radiant ray; (c) a surfactant; and (d) a solvent.
Claims13
A positive radiation-sensitive composition comprising:
- (a) a resin whose solubility in an alkali developer increases by the action of an acid;
- (b) a compound that generates a carboxylic acid having a molecular weight of 100 or less upon irradiation with an actinic ray or a radiant ray;
- (c) a surfactant;
- and
- (d) a solvent,
- wherein compound (b) is present in an amount of from 1 to 20 wt % based upon the solid contents, and the compound (b) is a compound represented by the following formula (I):
- wherein R11, R12, R13, R14 and R15 each independently represents a hydrogen atom, a straight chain, branched or cyclic alkyl group, a straight chain, branched or cyclic alkoxyl group, a hydroxyl group, a halogen atom, or —S—R0;
- R0 represents a straight chain, branched or cyclic alkyl hydroxyl group, a halogen atom, or —S—R0;
- R0 represents a straight chain, branched or cyclic alkyl group, or an aryl group, A+ represents S+ or I+;
- B− represents CH3COO−, C2H5COO− or C3H7COO−;
- and m represents 2 or 3.
8 more elements
Dependencies are inferred from the claim text.