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US 6,806,022 B1Granted
Positive photosensitive resin composition
AssigneeFuji Photo Film Co., Ltd.
InventorsYasumasa Kawabe, Kenichiro Sato, Toshiaki Aoai
Life of this patent
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Abstract
Provided is a positive photosensitive resin composition comprising (A) a polymer which has alicyclic hydrocarbon skeletons and composes under the action of an acid to be rendered soluble in alkali, (B) a compound which generates an acid upon irradiation with actinic rays, (C) a nitrogen-containing basic compound, (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant and (E) a solvent. The composition can exhibit better characteristics when the solvent (E) is a combination of specified solvents.
Claims26
A positive photosensitive resin composition comprising:
- (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes by the action of an acid to thereby become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound, and
- (D) at least one fluorine-containing surfactant.
1 more element
A positive photosensitive resin composition comprising:
- (A) a polymer which has bridged alicyclic hydrocarbon skeletons and decomposes by the action of an acid to thereby become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound,
- (D) at least a fluorine-containing surfactant, and
- (E) a solvent;
- wherein the ratio of (B) to (C) by weight is from 5 to 300 and the ratio of (A) to (D) by weight is from 500 to 20,000.
3 more elements
A positive photosensitive resin composition comprising:
- (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound,
- (D) at least a fluorine-containing surfactant, and
- (E) a solvent comprising as a first solvent at least one solvent selected from the following group (a) in an amount of 60 to 90% by weight based on the total solvent and as a second solvent a solvent selected from the following group (b) in an amount of 10 to 40% by weight to the total solvent;
- the group (a) consisting of ethyl lactate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate and ethyl 3-ethoxypropionate, and the group (b) consisting of solvents having a viscosity of not higher than 1 centipoise at 20° C.
3 more elements
A positive photosensitive resin composition comprising:
- (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound,
- (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant, and
- (E) a solvent comprising (a) ethyl lactate in an amount of 60 to 90% by weight based on the total solvent and (b) ethyl 3-ethoxypropionate in an amount of 10 to 40% by weight based on the total solvent.
2 more elements
A positive photosensitive resin composition comprising:
- (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes by the action of an acid to thereby become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound, and
- (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant,
- wherein said polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to become alkali soluble contains a repeating unit selected from the group consisting of repeating units having the structural formulas (b-1) to (b-8):
- wherein A is selected from the group consisting of hydrogen, hydroxyl, a carboxyl group, an alkoxycarbonyl group, a substituted or unsubstituted alkyl group having from 1 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having from 1 to 10 carbon atoms, and a substituted or unsubstituted alkenyl group having from 1 to 10 carbon atoms;
- and R is selected from the group consisting of hydrogen and a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms.
4 more elements
A positive photosensitive resin composition comprising:
- (A) a polymer which has bridged alicyclic hydrocarbon skeletons and decomposes by the action of an acid to thereby become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound,
- (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant, and
- (E) a solvent;
- wherein the ratio of (B) to (C) by weight is from 5 to 300 and the ratio of (A) to (D) by weight is from 600 to 20,000 and
- wherein said polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to become alkali soluble contains a repeating unit selected from the group consisting of repeating units having the structural formulas (b-1) to (b-8):
- wherein A is selected from the group consisting of hydrogen, hydroxyl, a carboxyl group, an alkoxycarbonyl group, a substituted or unsubstituted alkyl group having from 1 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having from 1 to 10 carbon atoms, and a substituted or unsubstituted alkenyl group having from 1 to 10 carbon atoms;
- and R is selected from the group consisting of hydrogen and a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms.
6 more elements
A positive photosensitive resin composition comprising:
- (A) a polymer which has alicyclic hydrocarbon skeletons and decomposes by the action of an acid to thereby become alkali-soluble,
- (B) a compound which generates an acid upon irradiation with actinic rays,
- (C) a nitrogen-containing basic compound,
- (D) at least one of a fluorine-containing surfactant and a silicon-containing surfactant, and
- (E) a solvent comprising as a first solvent at least one solvent selected from the group (a) in an amount of 60 to 90% by weight based on the total solvent and as a second solvent a solvent selected from the following group (b) in an amount of 10 to 40% by weight to the total solvent;
- the group (a) consisting of ethyl lactate;
- propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate and ethyl 3ethoxypropionate, and the group (b) consisting of solvents having a viscosity of not higher than 1 centipoise at 20° C.;
- wherein said polymer which has alicyclic hydrocarbon skeletons and decomposes under the action of an acid to become alkali soluble contains a repeating unit selected from the group consisting of repeating units having the structural formulas (b-1) to (b-8):
- wherein A is selected from the group consisting of hydrogen, hydroxyl, a carboxyl group, an alkoxycarbonyl group, a substituted or unsubstituted alkyl group having from 1 to 10 carbon atoms, a substituted or unsubstituted alkoxy group having from 1 to 10 carbon atoms, and a substituted or unsubstituted alkenyl group having from 1 to 10 carbon atoms;
- and R is selected from the group consisting of hydrogen and a substituted or unsubstituted alkyl group having 1 to 3 carbon atoms.
7 more elements
Dependencies are inferred from the claim text.