Method and apparatus to remove additives and contaminants from a supercritical processing solution

A method of removing one or more solutes from a supercritical processing solution, the method comprising:

• generating a supercritical processing solution in a supercritical solution generator that is directly connected to a process vessel;
• flowing the supercritical processing solution through the process vessel and a recirculation loop, at least one of the process vessel and the recirculation loop comprising components of a contaminant removal mechanism;
• removing at least a portion of said one or more solutes with the contaminant removal mechanism to produce a purified solvent, said purified solvent having a reduced concentration of the one or more solutes;
• and
• recirculating the purified solvent through the process vessel and the recirculation loop;
• wherein removing at least a portion of said one more contaminants with the contaminant removal mechanism comprises exposing the supercritical processing solution to a set of conditions which separate the portion of said one or more solutes from the supercritical processing solution to produce the purified solvent and a contaminant phase.

An apparatus for removing one or more solutes from a supercritical solution, the apparatus comprising:

• a process vessel having a flow inlet and a flow outlet and configured to treat semiconductor wafers with the supercritical solution;
• a contaminant removal mechanism for removing one or more solutes from the supercritical solution to provide a purified solvent, the contaminant removal mechanism including:
• a single inlet connecting the flow outlet of the process vessel and the contaminant removal system;
• and
• a single outlet connecting the flow inlet of the process vessel and the contaminant removal system;
• and
• a recirculation loop coupled to the process vessel and allowing supercritical solution to flow in and out of the process vessel,
• wherein at least one of the process vessel and the recirculation loop comprise components of the contaminant removal mechanism.