Method and apparatus for the abatement of toxic gas components from a semiconductor manufacturing process effluent stream

An apparatus for abatement of at least one toxic gas component or by-product thereof, from an effluent stream deriving from a semiconductor manufacturing process, such apparatus comprising:

• a first sorbent bed material having a high capacity sorbent affinity for said at least one toxic gas component;
• a second and discreet sorbent bed material having a high capture rate for said at least one toxic gas component;
• and
• a flow path joining the process in gas flow communication with the sorbent bed materials such that the effluent stream contacts the first sorbent bed material then the second sorbent bed material to at least partially remove the at least one toxic gas component from the effluent stream.

An apparatus for abatement of at least one acid gas, hydride gas or by-product thereof, from an effluent stream deriving from a semiconductor manufacturing process, such apparatus comprising:

• a first sorbent bed material having a high capacity sorbent affinity for said at least one acid gas, hydride gas or by-product thereof;
• a second and discreet sorbent bed material having a high capture rate sorbent affinity for said at least one acid gas, hydride gas or by-product thereof;
• and
• a flow path joining the process in gas flow communication with the sorbent bed materials such that the effluent stream contacts the first sorbent bed material then the second sorbent bed material to at least partially remove the at least one acid gas, hydride gas or by-product thereof from the effluent stream.

A layered dry resin sorbent system for abatement of an acid gas, hydride gas or by-product thereof, comprising;

• a first sorbent bed material having a high capacity sorbent affinity for said acid gas, hydride gas or by-product thereof;
• a second and discreet sorbent bed material having a high capture rate sorbent affinity for said acid gas, hydride gas or by-product thereof;
• and
• a flow path joining the process in gas flow communication with the sorbent bed materials such that the effluent stream contacts the first sorbent bed material then the second sorbent bed material to at least partially remove the at least one acid gas, hydride gas or by-product thereof from the effluent stream.