Organic anti-reflective coating material and preparation thereof
AssigneeHynix Semiconductor Inc.
InventorsMin-ho Jung, Joong-il Choi
Life of this patent
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Abstract
An organic anti-reflective material, in particular one which prevents back reflection from the surface of or lower layers in the semiconductor device and eliminates the standing waves and reflective notching due to the optical properties of lower layers on the wafer, and due to the changes in the thickness of the photosensitive film applied thereon. The organic anti-reflective polymer is useful for forming ultrafine patterns of 64M, 256M, 1G, and 4G DRAM semiconductor devices. A composition containing such an organic anti-reflective polymer, and an anti-reflective coating formed therefrom and a preparation method thereof are also disclosed.
Claims17
A polymer comprising a structure represented by the following Formula 1:
- wherein:
- Ra and Rb are independently hydrogen or methyl;
- R′ and R″ are independently selected from the group consisting of —H, —OH, —OCOCH3, —COOH, —CH2OH, or an alkyl having 1 to 6 carbon atoms and alkoxy alkyl having 1 to 6 carbon atoms;
- n is an integer selected from the group consisting of 1, 2, 3, 4 and 5;
- and
- x and y each is a mole fraction ranging from about 0.01 to about 0.99.
Dependencies are inferred from the claim text.