Method for continuously blending chemical solutions
AssigneeAir Liquide America Corporation
InventorsKarl J. Urquhart, John B. Thompson, Joe G. Hoffman
Life of this patent
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Abstract
Provided are a method and apparatus for continuously blending a chemical solution for use in semiconductor processing. The method involves the step of: mixing a first chemical stream with a second chemical stream in a controlled manner, to form a stream of a solution having a predetermined formulation. The apparatus allows one to practice the above method. The method and apparatus can accurately provide chemical solutions of desired concentration in a continuous manner. The invention has particular applicability in semiconductor device fabrication.
Claims23
A method of continuously blending a chemical solution for use in semiconductor processing, comprising:
- mixing continuously a first chemical stream with a second chemical stream in a mixing zone in a conduit system and in a real time controlled manner forming a solution having a predetermined formulation, wherein the first chemical stream and the second chemical stream are continuously introduced to the mixing zone;
- adjusting continuously the flowrate of the first chemical and the flowrate of the second chemical;
- monitoring continuously the solution;
- and
- introducing the solution having a predetermined formulation into a semiconductor processing tool.
A method of continously blending a chemical solution for use in semiconductor processing, comprising the steps of:
- (a) mixing a first chemical with a second chemical in a first mixing zone in a conduit system and in a real time controlled manner to provide a first solution having a predetermined formulation;
- the flowrate of the first chemical and the flowrate of the second chemical are continuously adjusted;
- the first solution formulation is continuously monitored;
- and
- (b) mixing a third chemical with the first solution in a second mixing zone in said conduit system and in a real time controlled manner to provide a second solution having a predetermined formulation;
- the flowrate of the third chemical is continuously adjusted;
- second solution formulation is continuously monitored, wherein steps (a) and (b) are preformed contemporaneously.
A method of continuously blending a chemical solution on-site at a semiconductor manufacturing facility, comprising the steps of:
- (a) mixing a first chemical with a second chemical in a first mixing zone in a conduit system and in a real time controlled manner to provide a first solution having a predetermined formulation;
- the flowrate of the first chemical and the flowrate of the second chemical are continuously adjusted;
- the first solution is continuously monitored, and
- (b) mixing a third chemical with the first solution in a second mixing zone in said conduit system and in a real time controlled manner to provide a second solution having a predetermined formulation;
- the flowrate of the third chemical is continuously adjusted;
- the second solution formulation is continuously monitored, and
- (c) introducing the second solution having a predetermined formulation into a semiconductor processing tool, wherein steps (a) and (b) are performed contemporaneously.
Dependencies are inferred from the claim text.