Method for producing boride thin films
AssigneeThe Penn State Research Foundation
InventorsXianghui Zeng, Alexej Pogrebnyakov, Xiaoxing Xi, Joan M. Redwing, Zi-Kui Liu, Darrell G. Schlom
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Abstract
Thin films of conducting and superconducting materials are formed by a process which combines physical vapor deposition with chemical vapor deposition. Embodiments include forming boride films, such as magnesium diboride, in high purity with superconducting properties on substrates typically used in the semiconductor industry by physically generating magnesium vapor in a deposition chamber and introducing a boron containing precursor into the chamber which combines with the magnesium vapor to form a thin boride film on the substrate.
Claims15
A method of forming a thin film on a substrate, the method comprising:
- physically generating vapor from at least one source material, which is within a chamber with a substrate;
- and
- introducing at least one boron containing precursor to the chamber, which combines with the vapor from the at least one source material to form a boride containing thin film from the combined precursor and source material on the substrate.
A method of forming a thin film on a substrate, the method comprising:
- physically generating vapor from at least one source material, which is within a chamber with a substrate;
- and
- introducing at least one precursor to the chamber, which combines with the vapor from the at least one source material to form a thin film from the combined precursor and source material on the substrate while maintaining a pressure of 1 to 1,000 Torr in the chamber during formation of the thin film on the substrate.
Dependencies are inferred from the claim text.