Method for removing impurities from process gas stream
AssigneeMatheson Tri-Gas, Inc.
InventorsHans H. Funke, Dan Fraenkel, Virginia H. Houlding
Life of this patent
Estimating the term…
Loading patent…
AssigneeMatheson Tri-Gas, Inc.
InventorsHans H. Funke, Dan Fraenkel, Virginia H. Houlding
Estimating the term…
Trace impurities such as organic compounds and carbon monoxide are reduced to sub-ppb levels in gases such as nitrogen, helium and argon, by gas purifying systems that contain an ultra-low emission (ULE) carbon material. Ultra-low emission (ULE) carbon materials is capable of removing impurities from a gas stream down to parts-per-billion (ppb) and sub-ppb levels without concurrently emitting other impurities such as moisture or carbon dioxide to the purified gas stream. The carbon material is superactivated by heating the carbon to temperatures between 300-800° C. in an ultra-dry, inert gas stream. The ultra-low emission (ULE) carbon material is handled and stored in an environment that minimizes contamination from moisture and other oxygenated species in order to maintain its ppb and sub-ppb impurity removal and low emission properties.
A method for removing impurities from process gas stream comprising:
Dependencies are inferred from the claim text.