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AssigneesRenesas Technology Corp., Ryoden Semiconductor System Engineering Corporation
InventorsTaichi Yanaru, Masataka Okabe, Hirofumi Ohtsuka
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A process control device controls a plurality of processing devices placed in parallel to perform at least two process steps for consecutively processing workpieces in a lot. The process control device includes a device group information for grouping of a plurality of processing devices into a plurality of device groups. For example, when the workpieces are semiconductor devices, processing devices having identical deviating characteristics are grouped into the same group to perform a plurality of photolithographic steps. The process control device further includes a device group selecting unit for selecting the device group such that the lot is processed in the second process step using a processing device included in the same device group as a processing device used in the first process step.
A process control device for controlling a plurality of processing devices placed in parallel to perform a first process step for processing workpieces sorted into a lot and a second process step for further processing the lot processed in the first process step, comprising:
A process control method for controlling a plurality of processing devices placed in parallel to perform a first process step for processing workpieces sorted into a lot and a second process step for further processing the lot processed in the first process step, comprising the steps of:
Dependencies are inferred from the claim text.