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US 6,788,386 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsHendrikus Herman Marie Cox, Frank Auer, Marc Wilhelmus Maria Van Der Wijst, Bastiaan Stephanus Hendrikus Jansen, Dominicus Jacobus Petrus Adrianus Franken
Life of this patent
Estimating the term…
Abstract
A reaction mass and an actuator are used to reduce unwanted vibrations of an optical element in the projection system of a lithographic projection apparatus. The reaction mass may be mechanically connected only to the optical element or may be compliantly mounted to the projection system frame.
Claims16
A lithographic projection apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate, wherein at least one of the projection and radiation systems comprises at least one optical element connected by at least one actuator to at least one reaction mass that is moveable in at least one degree of freedom, the force exerted by the actuator between the reaction mass and the optical element being used to control the position of the optical element in one or more degrees of freedom.
1 more element
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- providing a projection beam of radiation using a radiation system;
- using a patterning device to endow the projection beam with a pattern in its cross-section;
- projecting the patterned beam of radiation onto a target portion of the layer of radiation-sensitive material using a projection system, wherein an actuator is connected between a reaction mass that is moveable in at least one degree of freedom and an optical element in at least one of the projection and radiation systems;
- using a force exerted by the actuator between the reaction mass and the optical element to control the position of the optical element.
2 more elements
Dependencies are inferred from the claim text.