Reflector structure of a multi-domain liquid crystal display and its fabrication method

A reflector fabrication process for a multi-domain liquid crystal display comprising the steps of:

• (a) preparing a base substrate comprising a dielectric material;
• (b) using multiple photo-masks to form an active matrix device structure including a first insulator layer on said base substrate, said base substrate having a base coat layer covering said dielectric material and said active matrix device structure being formed with a plurality of regions of different height levels with the steps of:
• (b1) forming a patterned poly-Si layer on said base coat layer;
• (b2) depositing a first insulator layer on said patterned poly-Si layer and said base coat layer;
• (b3) forming a patterned first metal layer on said first insulator layer;
• (b4) depositing a second insulator layer on said patterned first metal layer and etching said second insulator layer to form contact holes for contacting with lower layers;
• (b5) forming a patterned second metal layer on said second insulator layer;
• (b6) depositing a third insulator layer on said patterned second metal layer;
• said second insulator layer and said base coat layer, and etching said third insulator layer to form contact holes for contacting with said second metal layer;
• and
• (b7) depositing a patterned transparent layer on said third insulator layer to form an active matrix device structure with regions of various height levels;
• and
• (c) using a multi-gap reflector process to form a structure of a multi-domain reflective layer above said active matrix device structure with regions of different height levels.