High permeability composite films to reduce noise in high speed interconnects
AssigneeMicron Technology, Inc.
InventorsLeonard Forbes, Kie Y. Ahn, Salman Akram
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AssigneeMicron Technology, Inc.
InventorsLeonard Forbes, Kie Y. Ahn, Salman Akram
Estimating the term…
A memory device is provided with a structure for improved transmission line operation on integrated circuits. The structure for transmission line operation includes a first layer of electrically conductive material on a substrate. A first layer of insulating material is formed on the first layer of the electrically conductive material. A number of high permeability metal lines are formed on the first layer of insulating material. The number of high permeability metal lines includes composite hexaferrite films. A number of transmission lines is formed on the first layer of insulating material and between and parallel with the number of high permeability metal lines. A second layer of insulating material is formed on the transmission lines and the high permeability metal lines. The structure for transmission line operation includes a second layer of electrically conductive material on the second layer of insulating material.
A differential line circuit in a Dynamic Random Access Memory (DRAM), comprising:
A memory device, comprising:
A memory device, comprising:
A memory device, comprising:
A memory device, comprising:
Dependencies are inferred from the claim text.