Transistor
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorTatsuya Honda
Life of this patent
Estimating the term…
Abstract
A field effect transistor is provided in which a drain current is not influenced by fluctuation of a gate voltage. In order to set the transistor in an on state (conductive state), a voltage equal to or more than a threshold voltage is applied to an inversion layer formation region (19) via a gate electrode (12) to thereby form an inversion layer. Charge inducted by the inversion layer moves to a channel region (18) and make the Fermi level of the channel region (18) fluctuate, and then, a potential barrier between a source region (16) and the channel region (18) is lowered. As a result, carriers can climb over the barrier and move from the source region (16) to a drain region (17), and thus, a drain current flows.
Claims12
A transistor comprising:
- a semiconductor layer including a channel region, a source region, and a drain region;
- an insulating film that contacts the semiconductor layer;
- and
- a gate electrode adjacent to the semiconductor layer with the insulating film interposed therebetween, wherein:
- a semiconductor region that contacts the channel region is provided in the semiconductor layer;
- and
- the gate electrode is provided over the insulating film so as to overlap with the semiconductor region that contacts the channel region, and so as not to overlap with the channel region.
A transistor comprising:
- a semiconductor layer including a channel region, a source region, and a drain region;
- an insulating film that contacts the semiconductor layer;
- and
- a gate electrode adjacent to the semiconductor layer with the insulating film interposed therebetween, wherein:
- a semiconductor region that contacts the channel region and the source region is provided in the semiconductor layer;
- and
- the gate electrode is provide over the insulating film so as to overlap with the semiconductor region that contacts the channel region and the source region, and so as not to overlap with the channel region.
A transistor comprising:
- a semiconductor layer including a channel region, a source region, a drain region, and at least one inversion layer formation region;
- an insulating film formed over the semiconductor layer;
- and
- at least one gate electrode overlapped with the inversion layer formation region over the insulating film,
- wherein the inversion layer formation region contacts the channel region, and
- wherein the gate electrode is provided so as not to overlap with the channel region.
A transistor comprising:
- a semiconductor layer including a channel region, a source region, a drain region, and at least one inversion layer formation region;
- an insulating film formed over the semiconductor layer;
- and
- at least one gate electrode overlapped with the inversion layer formation region over the insulating film,
- wherein the inversion layer formation region contacts the channel region and the source region;
- and
- wherein the gate electrode is provided so as not to overlap with the channel region.
Dependencies are inferred from the claim text.