Charged-particle beam drawing data creation method, and charged-particle beam drawing apparatus using the same

A charged-particle beam exposure apparatus for supplying bit information created from design pattern data in a scanning direction of a charged-particle beam, ON/OFF-controlling the charged-particle beam to irradiate a sample surface, and exposing a two-dimensional pattern by scanning the charged-particle beam, the apparatus comprising:

• means for extracting a cell pattern as one unit of a periodic structure from design pattern data having a periodic structure, and registering the cell pattern;
• means for creating arrangement data to be rearranged in a basic drawing region defined by the charged-particle beam exposure apparatus using the cell pattern, and registering the arrangement data;
• and
• means for cutting out data from the cell pattern in accordance with information of the arrangement data, and creating data of the basic drawing region.

A device manufacturing method of irradiating a charged-particle beam to a surface based on data of a basic drawing region defined by a charged-particle beam exposure apparatus, and patterning on the surface in accordance with a design pattern, the method comprising the steps of:

• extracting a cell pattern as one unit of a periodic structure from the design pattern;
• creating arrangement data used in a case of forming the data of the basic drawing region from data of the cell pattern;
• and
• forming the data of the basic drawing region from the data of the cell pattern based on the created arrangement data.