Arc chamber filament for ion implanter
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsHom-Chung Lin, Mei-Lan Hung, Chi-Fu Yu, Shin-Ho Tzeng
Life of this patent
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Abstract
An arc chamber filament for an ion implanter used to implant ions in a semiconductor wafer substrate during the fabrication of integrated circuits on the substrate. The filament includes a pair of parallel filament segments each of which is connected to a voltage source at one end. The parallel filament segments are connected to each other through a bidirectional winding configuration which defines at least one generally U-shaped winding unit on each side of a plane of symmetry bisecting the filament.
Claims20
An arc chamber filament for an ion implanter, comprising:
- a pair of parallel segments;
- at least one winding filament unit carried by each of said pair of parallel segments;
- and
- a bridge segment connecting said at least one winding filament unit of one of said pair of parallel segments to said at least one winding filament unit of an other of said pair of parallel segments.
An arc chamber filament for an ion implanter, comprising:
- a pair of parallel segments;
- at least two winding filament units carried by each of said pair of parallel segments;
- and
- a bridge segment connecting said at least two winding filament units of one of said pair of parallel segments to said at least two winding filament units of an other of said pair of parallel segments.
An arc chamber filament for an ion implanter, comprising:
- a pair of parallel segments;
- at least three winding filament units carried by each of said pair of parallel segments;
- and
- a bridge segment connecting said at least three winding filament units of one of said pair of parallel segments to said at least three winding filament units of an other of said pair of parallel segments.
Dependencies are inferred from the claim text.