Loading patent…
AssigneeSony Corporation
InventorsSatoru Ishii, Satoshi Sasaki
Estimating the term…
There is provided an MR manufacturing method comprising a film-forming process for forming a multilayer film including at least an antiferromagnetic layer 4, a fixed layer 3 and a spacer layer 5, a first patterning process for patterning the multilayer film after a predetermined pattern, a filing process for filling up the circumference of the patterned multilayer film, with an insulating layer 13 a process for forming a magnetic flux guide layer or a free layer also acting as the magnetic flux guide layer over this insulating layer 13 and the patterned multilayer film and a second patterning process by beam etching for simultaneously patterning the magnetic flux guide layer and the above-mentioned multilayer film to form the above-mentioned multilayer structure portion, wherein an incident angle of the etching beam are selected so that an angle θ of an etching surface relative to a normal is selected in a range of from 10°≦θ≦40°, preferably, 15°≦θ≦35°. Thus, etch rates of the materials composing the multilayer structure portion and materials compoising the insulating layer become nearly equal, whereby etchings at the respective portions can be achieved satisfactorily with high accuracy. As a result, characteristics of the magneto-resistive effect element and the magneto-resistive effect type magnetic head can be stabilized, and the yield thereof can be improved.
A method of manufacturing a magneto-resistive effect element including a multilayer structure portion in which there are laminated at least a magnetic flux guide layer, a free layer made of a soft magnetic material of which the magnetization is rotated in response to an external magnetic field or said free layer also acting as said magnetic flux guide layer, a fixed layer made of a ferromagnetic material, an antiferromagnetic layer for fixing the magnetization of said fixed layer and a spacer layer interposed between said free layer and said fixed layer, said method of manufacturing said magneto-resistive effect element comprising:
A method of manufacturing a magneto-resistive effect type magnetic head having a magneto-resistive effect element in which a magnetic sensing portion includes such a multilayer structure portion that there are laminated at least a magnetic flux guide layer, a free layer made of a soft magnetic material of which the magnetization is rotated in response to an external magnetic field or said free layer also acting as said magnetic flux guide layer, a fixed layer made of a ferromagnetic material, an antiferromagnetic layer for fixing the magnetization of said fixed layer and a spacer layer interposed between said free layer and said fixed layer, said method of manufacturing a magneto-resistive effect type magnetic head comprising:
Dependencies are inferred from the claim text.