Solvents and photoresist compositions for short wavelength imaging
AssigneeShipley Company, L.L.C.
InventorsCharles R. Szmanda, Anthony Zampini
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Abstract
New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.
Claims23
A photoresist composition comprising a fluorinated resin, a photoactive component, and a solvent component, the solvent component comprising a mixture of least two distinct solvents, wherein one of the distinct solvents does not contain a ketone moiety, and with the exclusion of a solvent component consisting of methyl ethyl ketone and chlorobenzene.
- and wherein the solvent component comprises at least two solvents that can form a room temperature azeotrope.
A photoresist composition comprising a fluorinated resin, a photoactive component, and a solvent component, the solvent component comprising a mixture of at least three distinct solvents,
- and wherein the solvent component comprises at least two solvents that can form a room temperature azeotrope.
A photoresist composition comprising a fluorinated resin, a photoactive component, and a solvent component, the solvent component comprising at least two solvents that can form a room temperature azeotrope.
Dependencies are inferred from the claim text.