Positive photoresist composition for far ultraviolet exposure

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin capable of decomposing under the action of an acid to increase the solubility in alkali, containing a repeating unit having a group represented by the following formula (I), and
• (C) a fluorine-containing and/or silicon-containing surfactant:
• wherein R1 represents hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, which may have a substituent, R2 to R7, which may be the same or different, each represents hydrogen atom, an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent or an alkenyl group which may have a substituent, provided that at least one of R6 to R7 is not a hydrogen atom and R6 and R7 may combine to form a ring, and m and n each independently represents 0 or 1, provided that m and n are not 0 at the same time.

A positive photoresist composition for far ultraviolet exposure, comprising:

• (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation,
• (B) a resin capable of decomposing under the action of an acid to increase the solubility in alkali, containing a repeating unit represented by the following formula (AI), and
• (D) a solvent containing the following solvent (a) in an amount of 60% to 90 wt % based on the entire solvent:
• (a) at least one first solvent selected from propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate and ethyl 3-ethyoxypropionate;
• wherein R represents hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group having from 1 to 4 carbon atoms, A′ represents a single bond and B represents a group represented by formula (I):
• wherein R1 represents hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, which may have a substituent, R2 to R7, which may be the same or different, each represents hydrogen atom, an alkyl group which may be substituent, a cycloalkyl group which may have a substituent or an alkenyl group which may have a substituent, provided that at least one of R6 and R7 is not a hydrogen atom and R6 and R7 may combine to form a ring, and m and n each independently represents 0 or 1, provided that m and n are not 0 at the same time.