Hydrothermal treatment of nanostructured films
AssigneeEKC Technology, Inc.
InventorsShyama P. Mukherjee, Harold O. Madsen, Paul J. Roman, Jr., Leo G. Svendsen
Life of this patent
Estimating the term…
Abstract
The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.
Claims21
A method of forming a film on a substrate comprising the steps of:
- selecting at least one precursor material;
- applying said precursor material to a substrate to form a precursor layer;
- converting at least a portion of the precursor layer;
- developing the precursor layer to form a film;
- and
- hydrothermally treating said film.
A method of forming a film on a substrate containing a polymer, comprising the steps of:
- selecting at least one precursor material;
- applying said precursor material to a substrate to form a precursor layer;
- converting at least a portion of the precursor layer photolytically;
- developing the precursor layer to form a film;
- hydrothermally treating said film at a temperature from about 150° C. to about 300° C.;
- and then baking said film is at a temperature from about 300° C. to about 400° C.
Dependencies are inferred from the claim text.