Coating composition for the production of insulating thin films
AssigneeAsahi Kasei Kabushiki Kaisha
InventorsHiroyuki Hanahata, Toru Araki, Mikihiko Nakamura
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AssigneeAsahi Kasei Kabushiki Kaisha
InventorsHiroyuki Hanahata, Toru Araki, Mikihiko Nakamura
Estimating the term…
Disclosed is a coating composition for use in producing an insulating thin film, comprising: (A) at least one silica precursor comprised of at least one compound selected from the group consisting of an alkoxysilane and a hydrolysis product thereof; (B) at least one organic polymer; (C) water; (D) at least one alcohol; and optionally (E) an organic solvent for a mixture of the components (A), (B), (C) and (D); wherein the weight ratio (WR) of the water (C) to the at least one silica precursor (A) satisfies the formula 0.01<WR<10, and the weight of the water (C) is larger than that of the at least one alcohol (D), with the proviso that when the at least one organic polymer (B) is insoluble in a mixture of the water (C) and the alcohol (D), the coating composition comprises all of the components (A) to (E).
A coating composition for use in producing an insulating thin film, comprising:
Dependencies are inferred from the claim text.