Deposition methods for improved delivery of metastable species
AssigneeMicron Technology, Inc.
InventorsGaro J. Derderian, Gurtej S. Sandhu
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AssigneeMicron Technology, Inc.
InventorsGaro J. Derderian, Gurtej S. Sandhu
Estimating the term…
The invention includes a deposition system having a reservoir for containment of a metastable specie connected to a deposition chamber. The system includes a metastable specie generating catalyst within the reservoir. The invention includes an atomic layer deposition apparatus having a substrate platform within a deposition chamber and a dispersion head positioned between inlets and the substrate platform. The ALD apparatus includes first and second containment reservoirs in fluid communication with the deposition chamber through the inlets. One or more sources of carrier gas are configured to deliver carrier gas through at least one of the inlets. The invention also includes an atomic layer deposition method. A metastable specie is generated and is contained in a pre-chamber reservoir. The metastable specie is flowed from the reservoir into the chamber and at least a portion at the metastable specie is deposited onto a substrate.
A method of providing material into a deposition chamber comprising:
A layer deposition method comprising:
A layer deposition method comprising:
A method of depositing material on a substrate comprising:
An atomic layer deposition method comprising:
Dependencies are inferred from the claim text.