Gas-expanded liquids, methods of use thereof, and systems using gas-expanded liquids for cleaning integrated circuits
AssigneeGeorgia Tech Research Corporation
InventorsMatthew T. Spuller, Dennis W. Hess
Life of this patent
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Abstract
Gas-expanded liquids, methods of use thereof, and systems of using gas-expanded liquids are provided. One exemplary system, among others, includes: a gas-expanded liquid system comprising a gas and a liquid, wherein the gas-expanded liquid system is adapted to generate a gas-expanded liquid; and a substrate handling system adapted to position a substrate having a photoresist layer so that the gas-expanded liquid can be made to contact the substrate to remove the photoresist layer.
Claims19
A method of cleaning a substrate, comprising:
- exposing at least a portion of the substrate to a gas-expanded liquid;
- and
- removing a photoresist layer from the exposed portion of the substrate.
A photoresist cleaning system, comprising:
- a gas-expanded liquid system comprising a gas and a liquid, wherein the gas-expanded liquid system is adapted to generate a gas-expanded liquid;
- and
- a substrate handling system adapted to position a substrate so that the gas-expanded liquid contacts the substrate to remove a photoresist layer from the substrate.
A substrate cleaned by the following method, comprising:
- exposing at least a portion of the substrate to a gas-expanded liquid;
- and
- removing a photoresist layer from the exposed portion of the substrate.
Dependencies are inferred from the claim text.