Management system and apparatus, method therefor, and device manufacturing method

A management method of managing a parameter for a semiconductor device manufacturing apparatus which operates in accordance with a parameter, said method comprising:

• an obtaining step of obtaining evaluation values of an operation result of the semiconductor device manufacturing apparatus corresponding to a plurality of parameter values of the parameter;
• a holding step of holding the evaluation value obtained in the obtaining step for each object to be processed by the semiconductor device manufacturing apparatus;
• and
• an optimization step of analyzing the evaluation values held in the holding step, and optimizing the parameter on the basis of at least one of a sensitivity representing a change degree of the evaluation value upon the change in the parameter value, and a variation amount of the evaluation values for each object to be processed.

A management apparatus for managing a semiconductor device manufacturing apparatus, said apparatus comprising:

• communication means for communicating with the semiconductor device manufacturing apparatus, which operates in accordance with a parameter;
• obtaining means for obtaining evaluation values of an operation result of the semiconductor device manufacturing apparatus corresponding to a plurality of parameter values of the parameter;
• holding means for holding the evaluation values obtained by said obtaining means for each object to be processed by the semiconductor device manufacturing apparatus;
• and
• optimization means for analyzing the evaluation values held by said holding means, and optimizing the parameter on the basis of at least one of a sensitivity representing a change degree of the evaluation value upon the change in the parameter, and a variation amount of the evaluation values for each object to be processed.

A semiconductor device manufacturing apparatus management method using an apparatus connected via communication means to a semiconductor device manufacturing apparatus, which operates in accordance with a parameter, said method comprising:

• an obtaining step of obtaining evaluation values of an operation result of the semiconductor device manufacturing apparatus corresponding to a plurality of the parameter values of the parameter;
• a holding step of holding an estimation result of the evaluation value obtained in the obtaining step for each object to be processed by the semiconductor device manufacturing apparatus;
• and
• an optimization step of analyzing the evaluation values held in the holding step, and optimizing the parameter on the basis of at least one of a sensitivity representing a change degree of the evaluation values upon the change in the parameter, and a variation amount of the evaluation values for each object to be processed.