Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe

A near field light generating method comprising the following steps:

• preparing a probe comprising a light-blocking film having an aperture comprised of a major opening and slits surrounding the major opening;
• polarizing a light emitted from a light source in a specific direction of oscillation of an electric field vector;
• irradiating the polarized light into the aperture from one side of the light-blocking film such that (i) the longitudinal direction of slits are either parallel to or at an acute angle with the specific direction of the oscillation of the electric field vector, and (ii) (a) free electrons at the surface of the light-blocking film at one side of the major opening migrate towards the major opening and (b) free electrons at the surface of the light-blocking film at the other side of the major opening migrate away from the major opening, and an electric field is created by utilizing the migrated electrons in the same direction as the electric field of the irradiated light;
• and
• penetrating a portion of the created electric field to the other side of the aperture to become a near field light having a high intensity compared with that generated by the major opening only.