Semiconductor nonvolatile storage element and method of fabricating the same

A semiconductor nonvolatile storage element which is a ferroelectric nonvolatile storage element, comprising:

• a semiconductor substrate defining a source region, a drain region and a channel region between the source region and the drain region;
• and
• a field effect transistor including a structure successively laminated with a first insulator layer, a first conductor layer, a ferroelectric layer and a second conductor layer on the channel reman of the semiconductor substrate, the first insulator layer extending over the entire channel region to thereby completely separate the semiconductor substrate from the first conductor layer;
• the field effect transistor further including a third conductor and a fourth conductor respectively formed on the source region and the drain region, the field effect transistor further comprising:
• a second insulator thin film between the third conductor and the first conductor layer and between the fourth conductor and the first conductor layer;
• and
• recesses and projections included at a side wall of the third and the fourth conductors opposed to the first conductor layer.

A semiconductor nonvolatile storage element which is a ferroelectric nonvolatile storage element, comprising:

• a semiconductor substrate defining a source region, a drain region and a channel region between the source region and the drain region;
• and
• a field effect transistor including a structure successively laminated with a first insulator layer, a first conductor layer, a ferroelectric layer and a second conductor layer on the channel region of the semiconductor substrate, the first insulator layer extending over the entire channel region to thereby completely separate the semiconductor substrate from the first conductor layer;
• the field effect transistor further including a third conductor and a fourth conductor respectively formed on the source region and the drain region, the field effect transistor further comprising:
• a second insulator thin film between the third conductor and the first conductor layer and between the fourth conductor and the first conductor layer;
• and
• recesses and projections included at a side wall of the first conductor layer opposed to the third and the fourth conductors.