Exposure apparatus, control method thereof, and device manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorsMasato Muraki, Hiroya Ohta, Shin-ichi Hashimoto
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Abstract
This invention provides a multi-charged-particle beam exposure apparatus capable of easily correcting at a high precision the electron-optic characteristics of each column which constitutes an electron-optic system. The exposure apparatus has magnetic lens arrays (ML1, ML2, ML3, and ML4) which commonly adjust the electron-optic characteristics of a plurality of columns which constitute the electron-optic system, and dynamic focus lenses or deflector arrays which individually correct the electron-optic characteristics of the columns.
Claims10
An exposure apparatus which draws a pattern on a substrate with a plurality of charged-particle beams, comprising:
- a charged-particle beam generation source which generates a plurality of charged-particle beams grouped into a plurality of groups each formed from at least one charged-particle beam;
- a magnetic lens array which is constituted by arraying a plurality of magnetic lenses corresponding to the plurality of groups between said charged-particle beam generation source and a substrate stage which supports the substrate, the plurality of magnetic lenses being excited by a common excitation unit;
- a plurality of electron-optic elements which are arranged in correspondence with the plurality of groups and individually correct electron-optic characteristics of the plurality of magnetic lenses;
- and
- a control system which controls the common excitation unit to adjust the electron-optic characteristics of the plurality of magnetic lenses at once, and individually controls said plurality of electron-optic elements to individually correct the electron-optic characteristics of the plurality of magnetic lenses, thereby optimizing an image formed on the substrate with the plurality of charged-particle beams grouped into the plurality of groups.
A method of controlling an exposure apparatus which draws a pattern on a substrate with a plurality of charged-particle beams, wherein
- the exposure apparatus includes
- a charged-particle beam generation source which generates a plurality of charged-particle beams grouped into a plurality of groups each formed from at least one charged-particle beam,
- a magnetic lens array which is constituted by arraying a plurality of magnetic lenses corresponding to the plurality of groups between the charged-particle beam generation source and a substrate stage which supports the substrate, the plurality of magnetic lenses being excited by a common excitation unit, and
- a plurality of electron-optic elements which are arranged in correspondence with the plurality of groups and individually correct electron-optic characteristics of the plurality of magnetic lenses,
- the control method comprises
- the first step of adjusting the electron-optic characteristics of the plurality of magnetic lenses at once by controlling the common excitation unit, and
- the second step of individually correcting the electron-optic characteristics of the plurality of magnetic lenses by individually controlling the plurality of electron-optic elements, and
- an image formed on the substrate with the plurality of charged-particle beams grouped into the plurality of groups is optimized by the first and second steps.
Dependencies are inferred from the claim text.