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US 6,784,070 B2Granted
Intra-cell mask alignment for improved overlay
AssigneeInfineon Technologies AG
InventorsEnio L. Carpi, Bernhard Liegl
Life of this patent
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Abstract
A method for intra-cell alignment of a substrate and mask comprises providing a substrate comprising an exposed photosensitive material, providing a phase-shift mask, and aligning the phase-shift mask to an intra-cell structure on the substrate.
Claims17
A method for intra-cell alignment of a substrate and a mask comprising the steps of:
- providing the substrate comprising a photosensitive material and an alignment structure in an intra-cell region of the substrate;
- providing a mask comprising a phase-shift region;
- exposing the mask and the substrate to a light for determining an alignment;
- determining a phase-conflict region by detecting a portion of the light reflected by the mask;
- and
- aligning the phase-shift region to the alignment structure of the substrate according to the phase-conflict region.
3 more elements
A method for intra-cell alignment of a substrate and a mask comprising the steps of:
- providing the substrate comprising a photosensitive material, a first alignment structure in a periphery region of the substrate and a second alignment structure in an intra-cell region of the substrate;
- providing a mask comprising a phase-shift region;
- pre-aligning the phase-shift region to the first alignment structure of the substrate;
- exposing the mask and the substrate to a light of a reflected mode;
- determining a phase-conflict region by detecting a portion of the light of the reflected mode reflected by the phase-shift region;
- and
- aligning the phase-shift region to the second alignment structure of the substrate according to the phase-conflict region.
4 more elements
Dependencies are inferred from the claim text.