Active matrix organic light emitting display and method of forming the same

A method of fanning an active matrix organic light emitting display (AM-OLED), comprising:

• providing a transparent substrate;
• forming a first metal layer on the transparent substrate and then patterning the first metal layer as a first scanning line extending along a X direction, a second scanning line extending along the X direction and an bottom electrode of a capacitor, wherein the bottom electrode of the capacitor is between the two scanning lines;
• forming a first insulating layer on the entire surface of the transparent substrate;
• forming an island structure on a predetermined TFT area over the first scanning line, wherein the island structure comprises a second insulating layer deposited on the first insulating layer and an amorphous silicon layer deposited on the second insulating layer;
• forming an etching stopper on the top of the island structure to cover a predetermined gate electrode of the predetermined TFT;
• forming a doped armorphous silicon layer and a second metal layer on the island structure in sequence;
• patterning the second metal layer as a data line extending in a Y direction and an upper electrode of the capacitor, and forming an opening on the island structure to separate the second metal layer as a source/drain electrode and separate the doped amorphous silicon layer as a source/drain diffusion region;
• forming a protection layer on the entire surface of the transparent substrate, an forming a first via and a second via, wherein the first via exposes one end of the second scanning line and the second via exposes one end of the upper electrode of the capacitor;
• forming a transparent-conductive layer on the entire surface of the transparent substrate, and then patterning the transparent-conductive layer as a display area and two electrical-connecting areas that cover the exposed areas of the first via and the second via;
• and
• forming a light-shielding layer on the entire surface of the transparent substrate, wherein the light-shielding layer covers at least the amorphous silicon layer of the predetermined TFT and exposes the display area.