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US 6,784,007 B2Granted
Nano-structures, process for preparing nano-structures and devices
AssigneeCanon Kabushiki Kaisha
InventorsTatsuya Iwasaki, Tohru Den
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Abstract
The present invention provides a nano-structure which can be applied to various high-function devices. The nano-structure includes an anodically oxidized layer having a plurality of kinds of pores.
Claims14
A process for preparing a nano-structure comprising an anodically oxidized layer comprising first and second pores having different diameters, the process comprising the steps of:
- (a) preparing a film containing aluminum and having predetermined first and second starting points for the respective pores on the surface of the film,
- wherein the predetermined first and second starting points are different from each other in at least one of shape and composition;
- and
- (b) anodically oxidizing the surface of the film.
1 more element
A process for preparing a nano-structure comprising an anodically oxidized layer having pores of different diameters, the process comprising the steps of:
- (a) preparing a film having different kinds of predetermined starting points on the surface of the film,
- wherein the different kinds of predetermined starting points differ in at least one of shape and composition;
- and
- (b) anodically oxidizing the film to form the pores of different diameters from the different kinds of predetermined starting points.
1 more element
Dependencies are inferred from the claim text.