Silicon-containing acetal protected polymers and photoresists compositions thereof
AssigneeArch Specialty Chemicals, Inc.
InventorsAndrew J. Blakeney, Sanjay Malik, Stephanie Dilocker, John Ferri, Jeffery Eisele
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Abstract
A photoresist composition comprising at least one acetal polymer having a silicon substituent; provided that the silicon substituent is not directly attached to the acetal functionality, thereby providing high resolution, improved DOF, and improved dimensional stability under metrology conditions.
Claims41
A photoresist composition comprising at least one acetal containing polymer having an acetal substituent, the acetal substituent containing a silicon substituent not directly attached to the acetal functionality.
A bilayer resist comprising:
- a photoresist layer comprising at least one polymeric acetal having an acetal substituent, the acteal substituuent containing a silicon substituent not directly attached to the acetal functionality;
- and
- an undercoat layer.
A photoresist composition comprising at least one acetal containing polymer having an acetal substituent, the acetal substituent containing a silicon substituent;
- not directly attached to the acetal functionality another photoresist polymer which may contain silicon;
- and a photoacid generator.
An acetal containing polymer having an acetal substituent, the acetal substituent containing a silicon substituent not directly attached to the acetal functionality.
Dependencies are inferred from the claim text.