Hydroxy-amino thermally cured undercoat of 193 nm lithography
AssigneeArch Specialty Chemicals, Inc.
InventorsPatrick Foster, Sydney George Slater, Thomas Steinhäusler, Andrew J. Blakeney, John Joseph Biafore
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Abstract
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
Claims23
A photolithographic sensitive coated susbstrate comprising:
- (a) a substrate;
- (b) a thermally cured undercoat on the substrate;
- and
- (c) a radiation-sensitive resist topcoat on the thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator;
- wherein said hydroxyl-containing polymer further comprises monomer units of cycloaliphatic ester of acrylic or methacrylic acid units, and
- wherein said radiation-sensitive resist topcoat is a chemically amplified resist containing silicon.
The coated substrate of claim 1 wherein said hydroxyl-containing polymer comprises the following monomer units:
- wherein R15 and R16 are independently a hydrogen or a methyl.
- 6.The coated substrate of claim 5 wherein the mole % of monomer unit (A) is about 25 to 60 mole % and the mole % of monomer unit (B) is about 40 to 75 mole %.
A process for the production of relief structures comprising the steps of:
- (a) forming a coated substrate;
- wherein said coated substrate comprises a substrate;
- a thermally cured undercoat disposed on said substrate;
- and a radiation-sensitive resist topcoat disposed on said thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator;
- and wherein said hydroxyl-containing polymer further comprises monomer units of cycloaliphatic ester of acrylic or methacrylic acid units;
- (b) imagewise exposing said radiation-sensitive resist topcoat to actinic radiation;
- and
- (c) forming a resist image by developing said radiation-sensitive resist topcoat with a developer.
The process of claim 42, further comprising the step of:
- removing said thermally cured undercoat composition to form an image thereof.
A process for the production of relief structures comprising the steps of:
- (a) forming a coated substrate;
- wherein said coated substrate comprises a substrate;
- a thermally cured undercoat disposed on said substrate;
- and a radiation-sensitive resist topcoat disposed on said thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer comprising about 30 to 60 mole % of hydroxystyrene monomer units and 40 to 70 mole % of isobornyl acrylate or methacrylate monomer units, an amino cross-linking agent and a thermal acid generator;
- and wherein said radiation-sensitive resist topcoat is a chemically amplified resist containing silicon;
- (b) imagewise exposing said radiation-sensitive resist topcoat to actinic radiation;
- and
- (c) forming a resist image by developing said radiation-sensitive resist topcoat with a developer.
A photolithographic sensitive coated substrate comprising:
- (a) a substrate;
- (b) a thermally cured undercoat on the substrate;
- and
- (c) a radiation-sensitive resist topcoat on the thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator;
- wherein said hydroxyl-containing polymer further comprises monomer units of cycloaliphatic ester of acrylic or methacrylic acid units.
A photolithographic sensitive coated substrate comprising:
- (a) a substrate;
- (b) a thermally cured undercoat on the substrate;
- and
- (c) a radiation-sensitive resist topcoat on the thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator;
- wherein said hydroxyl-containing polymer comprises biphenyl acrylate or methacrylate and hydroxyethyl acrylate or methacrylate.
A process for the production of relief structures comprising the steps of:
- (a) forming a coated substrate;
- wherein said coated substrate comprises a substrate;
- a thermally cured undercoat disposed on said substrate;
- and a radiation-sensitive resist topcoat disposed on said thermally cured undercoat;
- wherein said thermally cured undercoat comprises a thermally cured composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator;
- and wherein said hydroxyl-containing polymer comprises biphenyl acrylate or methacrylate and hydroxyethyl acrylate or methacrylate;
- (b) imagewise exposing said radiation-sensitive resist topcoat to actinic radiation;
- and
- (c) forming a resist image by developing said radiation-sensitive resist topcoat with a developer.
Dependencies are inferred from the claim text.