Photoacid generators and photoresists comprising same
AssigneeShipley Company, L.L.C.
InventorsJames F. Cameron, Gerhard Pohlers
Life of this patent
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Abstract
New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, non-ionic substituted disulfone compounds PAGS are provided, including disulfone PAGs that contain a diazo, substituted methylene or hydrazine moiety interposed between substituted sulfone groups. Also provided are positive- and negative-acting chemically amplified resists that contain such PAGs and that are preferably imaged with sub-300 nm or sub-200 nm radiation such as 248 nm, 193 nm, or 157 nm radiation.
Claims22
A photoresist composition comprising:
- 1) a resin that is at least substantially free of aromatic groups;
- and
- 2) a photoacid generator compound in an amount sufficient to permit development of an exposed coating layer of the composition, the photoacid generator compound being of the following Formula I:
- wherein R and R1 are different and are optionally substituted alkyl;
- optionally substituted alkoxy;
- optionally substituted alkylthio;
- optionally substituted carbocyclic aryl;
- optionally substituted aralkyl;
- optionally substituted heteroaryl;
- optionally substituted heteroalicyclic;
- phenyl having one more phenyl-ring electron-withdrawing substituents;
- an optionally substituted alicyclic group;
- optionally substituted naphthyl;
- optionally substituted thienyl;
- optionally substituted coumarinyl;
- optionally substituted quinolinyl;
- optionally substituted furyl;
- optionally substituted thiazolyl;
- optionally substituted oxazolyl;
- optionally substituted benzofuranyl;
- optionally substituted benzothiazolyl;
- or optionally substituted tetrahydrofuranyl;
- wherein at least one of R and R1 is phenyl having one more phenyl-ring electron-withdrawing substituents;
- an optionally substituted alicyclic group;
- optionally substituted naphthyl;
- optionally substituted thienyl;
- optionally substituted coumarinyl;
- optionally substituted quinolinyl;
- optionally substituted furyl;
- optionally substituted thiazolyl;
- optionally substituted oxazolyl;
- optionally substituted benzofuranyl;
- optionally substituted benzothiazolyl;
- or optionally substituted tetrahydrofuranyl.
A photoresist composition comprising:
- a resin and an α,α-methylenedisulfone photoacid generator compound in an amount sufficient to permit development of an exposed coating layer of the composition.
A photoresist composition comprising:
- a resin and a disulfonehydrazine photoacid generator compound in an amount sufficient to permit development of an exposed coating layer of the composition.
Dependencies are inferred from the claim text.