Electron beam exposure method using variable backward scattering coefficient and computer-readable recording medium having thereof

An electron beam exposure method, comprising the steps of:

• dividing an exposure region into a plurality of grating regions;
• obtaining respective pattern densities for the plurality of grating regions;
• generating a pattern map with locations of the exposure region in accordance with the pattern densities in the respective plurality of grating regions;
• determining backward scattering coefficients for the plurality of grating regions in accordance with the respective pattern densities and the locations of the exposure region;
• generating a backward scattering coefficient map with the locations of the exposure region in accordance with the backward scattering coefficients;
• calculating an exposure dose amount for the plurality of grating regions in accordance with the backward scattering coefficients obtained from the backward scattering coefficient map;
• and
• exposing the plurality of grating regions with the calculated exposure dose amount.

A recording medium having stored modules with instructions executable by a computer to perform a corrected electron beam exposure, the recording medium comprising:

• a first program module for obtaining a pattern density in one grating region produced by dividing an exposure surface into a plurality of grating regions;
• a second program module for obtaining a backward scattering coefficient η at the one grating region in accordance with the pattern density;
• and
• a third program module for obtaining an exposure dose amount from the backward scattering coefficient.

A recording medium having stored programs executable by a computer for performing a corrected electron beam exposure, the recording medium comprising:

• a first program module for obtaining pattern densities of a plurality of grating regions produced by dividing an exposure region;
• a second program module for obtaining a pattern density map with locations of the plurality of grating regions in accordance with the pattern densities;
• a third program module for obtaining backward scattering coefficients at the plurality of grating regions in accordance with the pattern densities and the locations of the exposure region;
• a fourth program module for generating a backward scattering coefficient map in accordance with the backward scattering coefficients;
• and
• a fifth program module for obtaining a corrected exposure dose amount at one of the plurality of grating regions in accordance with the backward scattering coefficients.