Method of reducing resistance for conductive film formed on base material
AssigneeFuji Xerox Co., Ltd.
InventorsShigemi Ohtsu, Eiichi Akutsu
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Abstract
A method of reducing resistance for a conductive film based on simple process at low temperatures, particularly a method of reducing resistance for a conductive film formed on a base of plastic resins is provided. A method of reducing resistance for a conductive film formed on a base material includes a treating process, in which a conductive film made of metal oxide is formed on a base material and irradiated with UV light in vacuum or in an atmosphere of reducing gas maintaining the temperature between 25° C. and 300° C.
Claims14
A method of reducing resistance for a conductive film made of metal oxide formed on a base material, comprising irradiating the film with UV light in a vacuum or in an atmosphere of reducing gas at a temperature maintained between 25° C. and 300° C.
Dependencies are inferred from the claim text.