Coils for generating a plasma and for sputtering
AssigneeApplied Materials, Inc.
InventorsJaim Nulman, Sergio Edelstein, Mani Subramani, Zheng Xu, Howard Grunes, Avi Tepman, John Forster, Praburam Gopalraja
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Abstract
A sputtering coil for a plasma chamber in a semiconductor fabrication system is provided. The sputtering coil couples energy into a plasma and also provides a source of sputtering material to be sputtered onto a workpiece from the coil to supplement material being sputtered from a target onto the workpiece. Alternatively a plurality of coils may be provided, one primarily for coupling energy into the plasma and the other primarily for providing a supplemental source of sputtering material to be sputtered on the workpiece.
Claims32
An apparatus for use with a signal source, for sputter deposition of a film layer onto a substrate, comprising:
- a vacuum chamber having a substrate support member disposed therein, a plasma generation area within said chamber, and a shield having a wall which substantially encircles said plasma generation area and said substrate support member;
- a first biasable target disposed in said chamber;
- a capacitor;
- and
- a sputterable coil insulatively carried by said shield wall and having a first end coupled to said signal source and a second end coupled to said capacitor, wherein said coil substantially encircles said plasma generation area and is positioned to couple energy inductively into said plasma generation area and positioned adjacent to said substrate support member to sputter material from said coil onto said substrate;
- further including a first power supply coupled to said first target and wherein said source includes a second power supply coupled to said coil.
A method of depositing material on a workpiece in a sputter deposition chamber, comprising
- sputtering target material onto said workpiece from a target positioned in said chamber;
- sputtering coil material onto said workpiece from a coil having a first end coupled to a signal source and a second end coupled to ground, said coil being insulatively carried by a shield wall substantially encircling a plasma generation area and positioned adjacent to and at least partially encircling said workpiece;
- and
- inductively coupling energy from said coil into said plasma generation area.
Dependencies are inferred from the claim text.